Advantages:

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The film has high purity, good compactness and good substrate adhesion;

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Higher ionization rate, faster deposition rate and lower substrate temperature rise;

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For most materials, as long as the target can be made, sputter can be achieved;

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Different materials can achieve mixed co-sputter;

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Reactive sputter can be done, using metal targets to deposit dielectric films.

Application:

Mainly used in semiconductor, microelectronics, aerospace, laser, infrared, optics, decoration and

other fields.

Our magnetron   sputter system:

Vikaitech can provide a variety of magnetron sputter products for customers in different fields, which

can be divided into confocal sputter and vertical sputter.

Advantages of   confocal sputter:

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A small target gun can be used to deposit films of high uniformity over a large area;

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A variety of targets can be used for co-sputter to conveniently obtain films of mixed materials;

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More suitable for research and development and small batch production.

Advantages of   vertical sputter:

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Single batch effective coating area is large;

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Fast deposition rate can be obtained over a large area;

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More suitable for large size samples and large-scale production.

Vikaitech can also provide Multi-chamber Integrated Magnetron Sputter System, Drum Magnetron

Sputter System and Chain Magnetron Sputter System according to different applications of

customers.