Advantages:

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The incident particle has good directivity, no drilling erosion and high steepness;

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Good controllability of etch rate, high graphic resolution, CD can be less than 0.1um;

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It belongs to physical etch, which can break through the limitation of etch materials;

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During the etch process, the ion beam incidence Angle can be changed to control the profile and

process the special structure;

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Good repeatability and high stability.

Application:

It can be used to etch and process various metals (Ni, Cu, Au, Al, Pb, Pt, Ti, etc.) and their alloys, as well

as oxides, nitrides, polymers, ceramics and other materials.

At present, ion beam etch has obvious advantages in non-silicon materials, and has a wide range of

applications in surface acoustic wave, thin film pressure sensor, infrared sensor and so on.

Our ion beam etch   system:

Vikaitech can provide a variety of ion beam etch products for customers in different fields, you can

choose a variety of ion sources.