Advantages:

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Each process chamber is independent of each other to minimize cross contamination;

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The ability of magnetron sputter, evaporation, etch and heat treatment can be combined through

different process chambers;

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Can effectively improve the process efficiency.

Application:

Mainly used in semiconductor, microelectronics, aerospace, laser, infrared, optics, scientific research

and other fields.

Our multi-chamber Cluster system:

Vikaitech can provide a variety of Cluster system for customers in different fields, which can be

divided into two categories of production and research and development.

Production multi-chamber Cluster system:

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The BROOKS automatic transmission chamber can be selected, or the special central chamber can

be customized according to customers needs;

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Single cavity multi-target and single cavity single-target process chamber can be selected;

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Optional fixed magnet target gun and rotary magnetic control;

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Can integrate ion beam etch and other functions;

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Low/high temperature workpieces can be integrated.

Developed multi-chamber Cluster system:

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Integrated magnetron sputter/electron beam evaporation/thermal evaporation /ALD/MBE

process chamber;

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Can integrate ion beam etch/reactive magnetron sputter process chamber, can deposit

optical films;

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Can integrate ultra-high vacuum (UHV) test chambers such as AES, XPS, spectrometers, etc.