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Ion sources:

Hall sources, RF sources and Kaufman sources with various

diameters from 4 inches to 8 inches.

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Round sputter cathodes:

Round sputter cathodes from 2 inches to 12 inches in diameter.

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Rectangular sputter cathodes:

Rectangular sputter cathodes with lengths from 500mm to

1200mm.

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Evaporation sources:

Special sources for depositing special materials such as

indium (In), ZnS, etc.

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Automatic manipulator:

Various automatic 2D/3D manipulators.

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Jigs & Fixtures:

More than 20 kinds of jigs and fixtures suitable for different

process requirements.

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Temperature control of stages:

Various stages with temperature control from -80℃ to 1200℃

can be provided.

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Operation System:

VKOS fully automatic control system developed for PVD

applications.