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Load-Lock:

Single/Multi-chip automatic Load-Lock chamber, optional

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Pumping system:

Cryopump/Magnetic suspension molecular pump + Dry pump

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Vacuum gauge:

Full range vacuum gauge + Capacitive diaphragm vacuum gauge

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Flow control:

Mass flow controller

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Sputter power supply:

DC/RF/Pulse DC, can be switched freely

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Bias:

RF/Pulse DC

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Number of cathodes:

Up to 5

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Ultimate vacuum:

8E-6Pa

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Temperature control range:

-50℃ to 800℃

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Uniform deposition area:

Max. Ø300mm

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Coating uniformity:

±2%

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Coating repeatability:

±2%

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Space requirements:

3.8m（Length）*3.0m（Width）*2.5m（Height）